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Creators/Authors contains: "Deepak Kumar and J. Todd Hastings"

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  1. (, The 65th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication)
    Variable Pressure - Electron Beam Lithography was conducted to study the effect of water vapor pressure on patterning PMMA. Water vapor does not appear to alter the radiation chemistry of positive-tone exposure. However, water vapor does alter the negative tone behavior in a manner consistent with simultaneous cross-linking and etching. 
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    Accepted Manuscript Full Text Available